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Things You'll Need
Instructions
Place the carbon nanotube sample on the chuck of the spin coater. Place a few drops of resist onto the sample. Start the spin-coater. A recipe should be used that leads to approximately 1,000 nm of resist. For the resist S1813, use a recipe of 4,000 revolutions per second for 60 seconds
Remove the sample from the spin-coater when the spinning has stopped. Place the sample onto a hot plate. Depending upon the type of resist used, the time and temperature will vary. Consult the resist documentation to determine optimum temperature and time on the hot plate. For S1813 resist, bake sample for three minutes at 100 degrees Celsius.
Place the sample into the mask aligner and expose a simple two electrode mask to the sample. The exposed parts of the sample will become chemically altered so they can be removed using a chemical known as a developer.
Place the sample into the resist developer. The amount of time in the developer is dependent upon the individual resist. Consult the resist and developer specifications for typical times. The parts of the sample that were exposed will be removed leaving a pattern. Metal can be deposited into this pattern to generate electrodes. Place the sample into an evaporator and place 1cm of gold wire in the evaporation crucible. Deposit approximately 100 nm of gold.
Place the sample in acetone. Acetone removes all parts of the resist that were exposed, leaving a gold pattern. Switch on the multimeter and select the resistance function. Place one multimeter probe on each electrode. The display should now indicate the resistance between the electrodes. The measured resistance is due to the current flowing between the electrodes (through the carbon nanotubes).